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PRODUCT GUIDE
Hercules® at a Glance
Semiconductor Plasma Process Sensor
Consulting Overview
Total Process Control Solution
PLASMA PROCESS CONTROL
Plasma Control Concept
Plasma Metrology
Data Handling
EXPERIENCE & TRAINING
Training Concept
Plasma School
RF TECHNOLOGY and PROCESS SERVICES
RF Chamber Matching
Spare Part Management
Uniformity Improvement
Large Area Uniformity Simulation
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Tool and Process
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2014 (c) Plasmetrex GmbH

Plasma Metrology System Hercules (R)

Lean SPC Solution


for CCP or ICP RF Plasma Processes in High-Volume Production in Semiconductor and Solar Cell Manufacturing:

-       Etch & Deposition

-       Process Development

-       Quality Management

-       Equipment Health

The SAPC Server is a stand-alone, easy-to-use Statistical Process Control (SPC) solution with additional APC features.

-      Merges Sensor (Plasma Parameters) and Tool Data

-       Process Control through Plasma Parameters

-       Tool Hardware Control through Tool Parameters

-       Statistical Process Control in Real Time

Step-wise Limits defined for the Statistical Moments:

-       Warning on Screen

-       Error Message in log-file

-       Error Message via e-mail

-       HSMS command to Tool




 

SEERS

NEED

Pressure range

up to 35 Pa

60 Pa – 1 kPa

Frequency range

5 – 100 MHz

5 – 40 MHz

Sensors for mainstream chambers available.

 Applicable for:

-       Chamber Matching

-       Fault Detection (by Plasma Parameters) and Classification (by Plasma and Tool Parameters)

-       Optimization of Conditioning

-       Process Development and Transfer

RF Technology & Process Services

Training & Consulting

RF Subsystem (from Generator to the Plasma)

-       RF Design

-       RF Re-design

-       RF Equipment Model → Improvement of RF Performance

-       RF Fault Detection and Classification by RF Parameters

Plasma Process Characterization

-       Improvement of Process Stability

-       Plasma induced Wafer Damaging

-       Process Transfer and Chamber Matching

 

RF School:

-       Industrial Radio Frequency Applications

Plasma School:

-       Plasma Physics Fundamentals

-       Process Fundamentals

-       Equipment:

-       Plasma Etch / Sputtering, Implantation / Plasma CVD

-       Process and Equipment Interaction

-       E-Chuck / Arcing / Conditioning

 

Consulting Overview